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Tuesday, July 28, 2020 | History

2 edition of Interlaboratory study on linewidth measurements for antireflective chromium photomasks found in the catalog.

Interlaboratory study on linewidth measurements for antireflective chromium photomasks

John M. Jerke

Interlaboratory study on linewidth measurements for antireflective chromium photomasks

by John M. Jerke

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  • 15 Currently reading

Published by U.S. Dept. of Commerce, National Bureau of Standards, For sale by the Supt. of Docs., U.S. G.P.O. in Washington, D.C .
Written in English

    Subjects:
  • Integrated circuits -- Masks.,
  • Optical measurements.

  • Edition Notes

    StatementJohn M. Jerke, M. Carroll Croarkin, Ruth N. Varner ; sponsored jointly by NBS and the Defense Advanced Research Projects Agency.
    SeriesSemiconductor measurement technology, NBS special publication ;, 400-74
    ContributionsCroarkin, Carroll., Varner, Ruth N., National Engineering Laboratory (U.S.), United States. Defense Advanced Research Agency.
    Classifications
    LC ClassificationsQC100 .U57 no. 400-74, TK7874 .U57 no. 400-74
    The Physical Object
    Paginationvii, 183 p. :
    Number of Pages183
    ID Numbers
    Open LibraryOL3140315M
    LC Control Number82600642

    INTERLABORATORY COMPARISON STUDY OF VISIBLE AND NEAR-INFRARED REFLECTANCE SPECTRA USING A SET OF COMMON STANDARD MATERIALS Takahiro Hiroi1, Sho Sasaki2, Mizuki Okazaki2, Moe Matsuoka3, Yudai Sato3, Tomoki Nakamura3, Ralph E. Milliken1, Carlé M. Pieters1 1Brown University, 2Osaka University, 3Tohoku University Introduction: Visible and near-infrared . 2 Interlaboratory comparison This paper will report on the rationale employed in the development of the CT-STARR (CT Surface Texture for Additive Round Robin) interlaboratory comparison. Intial measurement results will be presented. Stage 1 of the round robin (RR) will be a tightly controlled, rigorous and expeditious investigation.

    Interlaboratory Comparison of the Dicentric Chromosome Assay for Radiation Biodosimetry in Mass Casualty Events Article in Radiation Research (5) June with 69 Reads. Download this Chemical Test Tube Pictogram Icon Laboratory Glassware Or Beaker Equipment Isolated On Isolated Background Experiment Flasks Trendy Modern Vector Symbol Simple Flat Illustration vector illustration now. And search more of iStock's library of royalty-free vector art that features Analyzing graphics available for quick and easy download.

    Model for quantifying photoelastic fringe degradation by imperfect retroreflective backings Deonna Woolard and Mark Hinders Author Information. Author Affiliations. Deonna Woolard and Mark Hinders. D. Woolard is with the Department of Physics, Randolph-Macon College, Ashland, Virginia M. Hinders is with the Department of Applied. ISO specifies requirements and recommendations for the digital test file content, number of print replicates, printer setups and printing procedures that are used to generate target prints for test method standards and specifications for image stability in the context of Category: w.


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Interlaboratory study on linewidth measurements for antireflective chromium photomasks by John M. Jerke Download PDF EPUB FB2

Get this from a library. Interlaboratory study on linewidth measurements for antireflective chromium photomasks. [John M Jerke; Carroll Croarkin; Ruth N Varner; National Engineering Laboratory (U.S.); United States.

Defense Advanced Research Projects Agency.]. When a test method is applied to a large number of portions of a material that are as nearly alike as possible, the test results obtained will not all have the same value. A measure of the degree of agreement among these test results describes the precision of the test method for that material.

Numerical measures of the variability between such test results provide inverse measures of. Interlaboratory Study on Linewidth Measurements for Antireflective Chromium Photo masks,” NBS Special PublicationNational Bureau of Standards, Gaithersburg, MD ().

FILL IN BELOW TO RECEIVE YOUR FREE MOUSEPAD OF GAGEMAKERS TOLERANCE AND GD&T SYMBOLS. VLSI ELECTRONICS: MICROSTRUCTURE SCIENCE, VOL. 3 Chapter 7 Optical Linewidth Measurements on Photomasks and Waferst W. BULLIS D. NYYSSONEN Center for Electronics and Electrical Engineering National Bureau of Standards Washington, D.C.

Introduction Limitations of Traditional Methods Modeling of the Optical Image A. Image-Profile Calculations B. Focus Criteria by: Unfortunately, this book can't be printed from the OpenBook. If you need to print pages from this book, we recommend downloading it as a PDF. Visit to get more information about this book, to buy it in print, or to download it as a free PDF.

E Practice for Conducting an Interlaboratory Study to Determine the Precision of a Test Method. E Terminology Relating to Laboratory Accreditation. ANSI Standard. ANSI/ISO/ASQC Q Series: Quality Management and Quality Assurance Standards. ISO Standards. ISO Guide30, Terms and Definitions Used in Connection with Reference Materials.

Interlaboratory Study (ILS) of the Standard Test Method for Measuring the Night Vision Goggle-Weighted Transmissivity of Transparent Parts [Alan R. Pinkus, Harry L. Task] on *FREE* shipping on qualifying offers. This is a AIR FORCE RESEARCH LAB WRIGHT-PATTERSON AFB OH HUMAN EFFECTIVENESS DIRECTORATE report procured by the Pentagon and made available for public.

A potential low magnetic moment standard reference material (SRM) was studied in an interlaboratory comparison.

The mean and the standard deviation of the saturation moment m s, the remanent moment m r, and the intrinsic coercivity H c of nine samples were extracted from hysteresis-loop measurements.

Samples were measured by thirteen laboratories using inductive-field loopers, vibrating-sample. Interlaboratory comparison of size and surface charge measurements on nanoparticles prior to biological impact assessment.

J Nanopart Res. ; 13 (7)– doi: /sy. Salvati A, Pitek AS, Monopoli MP, Prapainop K, Bombelli FB, Cited by:   A pilot interlaboratory comparison of protocols that simulate aging of nanocomposites and detect released fragments. Published. October 1, Here we investigated the variations of the nanoparticle release phenomenon in polymer nanocomposites by a pilot interlaboratory comparative aging study of a polyamide composite containing 4 mass Cited by: Bright-chromium linewidth standard, SRMfor calibration of optical microscope linewidth measuring systems (SuDoc C ) [Carol F.

Vezzetti] on *FREE* shipping on Author: Carol F. Vezzetti. The present state of metrology does not permit the absolute calibration of linewidth standards to the level of uncertainty called for in the semiconductor roadmap. However, there are applications for a linewidth standard and calibration strategies which do not require a NIST certified calibration (e.g., determining measurement precision).Author: J Pedulla, James E.

Potzick, Richard M. Silver. This paper reports an interlaboratory comparison that evaluated a protocol for measuring and analysing the particle size distribution of discrete, metallic, spheroidal nanoparticles using transmission electron microscopy (TEM). The study was focused on automated image capture and automated particle analysis.

measurement tools. In this study, therefore, we focused on the consistency between relative measurements of two different samples. For calibrated measurements, measured voltages have to be scaled by the voltage cor-responding to a standard reference material.

This means VolumeNumber 2, March-April Participation in the interlaboratory comparison measurements Participation of metrology workplaces and their laboratories in interlaboratory comparative measurements The regular participation of the metrological workplaces and of their laboratories in the interlaboratory comparison measurements (ICM) is one of tools for assuring the quality of.

In preparation for the international Nano1 linewidth comparison on photomasks between nine national metrology institutes, the National Institute of Standards and Technology (NIST) and the Physikalisch-Technische Bundesanstalt (PTB), initiated a bilateral linewidth comparison inindependent of and prior to the Nano1 comparison in order to test the suitability of the mask standards Cited by: 2.

Question: Calculate The Minimum Thickness Needed For An Antireflective Coating (n = ) Applied To A Glass Lens In Order To Eliminate Blue (nm) Reflections For Light At Normal Incidence.

Calculate The Minimum Thickness Needed For An Antireflective Coating (n = ) Applied To A Glass Lens In Order To Eliminate Red (mn) Reflections For Light At Normal. The adhesion of chromium films to various glass substrates has been studied in various glass composition.

16 types of glasses were prepared by substituting B 2 O 3 for SiO 2, Al 2 0 3 for CaO, and RO and R 2 O for CaO respectively in an almino-silicate glass. The adhesion of chromium films is evaluated by the so-called "scratch test" and observation of pinholes generated by ultrasonic by: 1. Metrology in Microlithography Although opaque photomasks can be measured in either transmitted or reflected light, it is because of this increased sensitivity of reflected light measurements to material characteristics and geometry that the use of transmitted light is recommended [6].Cited by: 1.

BRDF Measurements and Analysis of Retrore ective Materials Laurent Belcour,1,2, Romain Pacanowski,3, y Marion Delahaie, 4Aude Laville-Geay, and Laure Eupherte 1Inria Bordeaux Sud-Ouest, avenue de la Vieille Tour,Talence, FRANCE 2Universite de Montr eal, chemin de la Tour, Montr eal, QC, CANADA 3CNRS, Esplanade des Arts et M etiers, Talence, FRANCECited by: 5.

e lenses to puncture on impact by sharp, high-speed missiles. Methods. Four groups of surfaced plano polycarbonate lenses were investigated. Two groups had a scratch-resistant (SR) coating applied to both surfaces. One of these groups had a 2-mm center thickness and the other had a 3-mm center thickness.

The other two groups of 2-mm and 3-mm thick lenses had a MAR coating applied over the SR.VRP photoplates. The plates are specifically designed for the manufacturing of high-precision photographic masks for microelectronics. The material is also used for Bragg diffraction X-ray tomography and radiography in many European Synchrotron facilities.Tropel® UltraFlat™ Photomask Form Analysis System Ultra-precise flatness measurements of substrates, mask blanks and photomasks The Tropel® UltraFlat™ Mask System, manufactured by Corning Tropel Corporation, is designed specifically for the photomask industry.

Its low measurement uncertainty makes the UltraFlat System the perfect tool.